HF Processing Laboratory | Department of Physics

HF Processing Laboratory

Being an extremely corrosive, hydrofluoric (HF) acid requires special attention in semiconductor industries as it is commonly used for cleaning Si surfaces via dissolving natural oxide layer in a 5 wt% diluted solution. This is also employed for etching Si not only for making surface pyramidal structures, but also for porous Si for photonic and optoelectronic application, photocatalysis, etc. Because of highly corrosive in nature, we have made a special fume hood for working with this solution and placed separately in HF safety room.


Ground Floor, Room: R012